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Abstract

Research & Development in Material Science

Fractal Properties of Etched Microcrystalline Silicon Surfaces

  • Open or CloseStanislav Jurečka1* and Martin Kopáni2

    1Institute of Aurel Stodola, Faculty of Electrical Engineering and Information Technology, University of Žilina, Slovakia

    2Institute of Medical Physics, Biophysics, Informatics and Telemedicine, Faculty of Medicine, Comenius University, Slovakia

    *Corresponding author: Stanislav Jurečka, Institute of Aurel Stodola, Faculty of Electrical Engineering and Information Technology, University of Žilina, Slovakia

Submission: December 21, 2021;Published: January 21, 2022

DOI: 10.31031/RDMS.2021.16.000888

ISSN : 2576-8840
Volume16 Issue3

Summary

Properties of the microcrystalline silicon surfaces etched by the hydrofluoric acid were analysed by different fractal methods. The surface microstructure of prepared samples was experimentally studied by the electron microscope. Obtained images were represented by the random height function and used in the determination of fractal characteristics useful in surface texture analysis (fractal dimension and succolarity). Obtained results were used in study of the influence of etching steps on the properties of formed surface microstructure.

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